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Vol. 1, No. 2 (Summer 2015) 6-10   

Link: http://www.acerp.ir/Vol1/No2/2.pdf
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  Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique
Z. Abadi, P. Sangpour and F. Tajabadi
( Received: January 06, 2015 – Accepted: February 10, 2015 )

Abstract    Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess 60-80% transmittance in the visible region. Calculating calculating optical band gap from UV-vis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.


Keywords    Graphene oxide, Graphene Oxide thin film, electrodeposition, GO optical band gap.


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